ATOMIC LAYER DEPOSITION APPLICATION FOR DEVELOPing THIN FILM LI-ION BATTERIES BASED ON TIN OXIDE IV
Basic principles of the atomic layer deposition (ALD) and it advantages for thin film Li-ion batteries production are discussed in this article. Possibility of synthesis for wide range materials, including tin oxide IV is shown. Influence synthesis parameters on deposition rate and a thin films structure are presented. Electrochemical characteristics of SnO2 thin film electrodes produced by ALD process are shown.